PHYSICS SEMINAR
An Introduction to the World of MEMS
Tackling the reliability issues of a micro-world
Jeremy Godin, M.Sc. Ph. D. Candidate
Sensors and Integrated MicroSystems Laboratory Department of Mechanical and Mechatronics Engineering University of Waterloo
Friday, September 21, 2012
1:30 p.m.
Hamilton 301
Abstract
Micro-Electro-Mechanical Systems (MEMS) has been identified as one of the most promising technologies for the 21st Century and has the potential to revolutionize both industrial and consumer products by combining silicon based microelectronics with micromachining technology(1). In this talk I will describe what MEMS are, how they are present in our everyday life and what goes into the fabrication and design of these marvels of engineering. We will begin with a brief history of the development of this technology as the offspring of the semi-conductor industry and highlight the milestones that have led us to today. Then, we will summarize the basic design and fabrication methods that are used to construct MEMS highlighting the reliability issues that we encounter and attempt to mitigate. Finally, I will present recent work (2) (3) done on the characterization of fabrication induced residual stress in silicon nitride thin films used in the construction of MEMS based infrared sensors.
References
- http://www.lboro.ac.uk/departments/mm/research/IPM-KTN/pdf/Technology_review/an-introduction-to-mems.pdf
- Godin J., Won S.P., Nieva P.M., Phong L.N., and Pope T., "Residual Stress Dependency on Wafer Location of Thin Film PECVD Silicon Nitride." Boston: TechConnect World, 2011.
- P. Nieva, J. Godin, R. Norris, A. Sohi, T. Leung, "Effects of dry plasma releasing process parameters and induced in-plane stress on MEMS devices yield", SPIE Photonics West 2012 MEMS-MOEMS, January 2012.
This talk is sponsored by the Speaker's Committee
